---
title: "Reports suggest that Samsung will introduce High-NA EUV lithography machines from ASML in early 2025"
description: "According to reports citing sources, Samsung Electronics will introduce the first High-NA EUV lithography machine EXE:5000 from ASML, expected to arrive in early 2025. Semiconductor equipment installa"
type: "news"
locale: "en"
url: "https://longbridge.com/en/news/218292018.md"
published_at: "2024-10-30T06:27:22.000Z"
---

# Reports suggest that Samsung will introduce High-NA EUV lithography machines from ASML in early 2025

> According to reports citing sources, Samsung Electronics will introduce the first High-NA EUV lithography machine EXE:5000 from ASML, expected to arrive in early 2025. Semiconductor equipment installation typically requires a longer testing period, and the lithography machine is expected to start operation as early as mid-2025. High-NA EUV is equipment required for advanced processes below 2 nanometers, and the South Korean industry expects Samsung to officially commence the commercialization process of 1-nanometer chips

According to reports citing sources, Samsung Electronics will introduce the first High-NA EUV lithography machine EXE:5000 from ASML, expected to arrive in early 2025. Semiconductor equipment installation typically requires a longer testing period, with the lithography machine expected to start operation as early as mid-2025. High-NA EUV is equipment required for advanced processes below 2 nanometers, and the South Korean industry expects Samsung to officially commence the commercialization process of 1-nanometer chips

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> **Disclaimer**: This article is for reference only and does not constitute any investment advice.