KFMI: Currently, the company's capacity utilization rate for high-purity metal sputtering targets and semiconductor precision components is good

KFMI stated in response to investor inquiries on the interactive platform that the current capacity utilization rate of the company's high-purity metal sputtering targets and semiconductor precision components is good. The main purposes of the company's private placement are as follows: 1. To establish a foothold in the high-purity metal sputtering target field, accelerate the globalization strategy layout, and enhance international competitiveness; 2. To continuously improve the business layout of semiconductor precision components; 3. To fully utilize the location advantages of the semiconductor industry in Shanghai and the Yangtze River Delta, enhancing the company's innovative service capabilities; 4. To strengthen the company's financial strength, optimize the financial structure, and improve the company's risk resistance capabilities