---
title: "Newway Photomask: The company’s production in the second quarter was close to full capacity and will further layout the research and development of 14nm semiconductor photomasks"
type: "News"
locale: "en"
url: "https://longbridge.com/en/news/244016664.md"
description: "Newway Photomask stated in a conference call that the company experienced strong downstream demand in the second quarter, with production nearing full capacity. The company is accelerating its investment pace in flat panel display photomasks and semiconductor photomasks, with multiple expansion projects progressing in an orderly manner. In addition, the company plans to further layout its research and development plan for 14nm semiconductor photomasks to achieve technological breakthroughs"
datetime: "2025-06-11T07:34:12.000Z"
locales:
  - [zh-CN](https://longbridge.com/zh-CN/news/244016664.md)
  - [en](https://longbridge.com/en/news/244016664.md)
  - [zh-HK](https://longbridge.com/zh-HK/news/244016664.md)
generator: "portal-rs"
---

# Newway Photomask: The company’s production in the second quarter was close to full capacity and will further layout the research and development of 14nm semiconductor photomasks

Newway Photomask stated in a conference call that the company experienced strong downstream demand in the second quarter, with production nearing full capacity. The company is accelerating its investment pace in flat panel display photomasks and semiconductor photomasks, with multiple expansion projects progressing in an orderly manner. In addition, the company plans to further layout its research and development plans for 14nm semiconductor photomasks to achieve technological breakthroughs

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> **Disclaimer: This article is for reference only and does not constitute any investment advice.**