---
type: "News"
locale: "zh-HK"
url: "https://longbridge.com/zh-HK/news/270685298.md"
description: "On December 24th, XILONG SCIENTIFIC stated on the interactive platform that the company has not yet produced photoresist. The products currently produced include reagents that accompany photoresist, such as stripping solution, developing solution, etching solution, cleaning solution, and so on"
datetime: "2025-12-24T03:55:37.000Z"
locales:
  - [zh-CN](https://longbridge.com/zh-CN/news/270685298.md)
  - [en](https://longbridge.com/en/news/270685298.md)
  - [zh-HK](https://longbridge.com/zh-HK/news/270685298.md)
---

> 支持的語言: [简体中文](https://longbridge.com/zh-CN/news/270685298.md) | [English](https://longbridge.com/en/news/270685298.md)


# 

On December 24th, XILONG SCIENTIFIC stated on the interactive platform that the company has not yet produced photoresist. The products currently being produced include reagents that accompany photoresist, such as stripping solution, developing solution, etching solution, cleaning solution, and so on

### 相關股票

- [XILONG SCIENTIFIC (002584.CN)](https://longbridge.com/zh-HK/quote/002584.CN.md)

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