The Anhui Jingmei high-end photomask project has started construction in Hefei, with a total investment of approximately 12 billion yuan

According to the WeChat public account "Hefei High-tech Release," on the morning of October 25th, the independent third-party semiconductor high-end photomask project—Anhui Jingmei Photomask officially broke ground in the High-tech Zone. The project covers an area of approximately 45.6 acres, with a total investment of about 12 billion yuan, focusing on the research and development, production, and sales of 28nm and above semiconductor photomasks. The total investment for the first phase of the project, which has commenced, is approximately 6.5 billion yuan, and it will build high-standard automated production lines, expected to be put into production in 2027, with a monthly production capacity of up to 3,200 wafers when fully operational