According to informed sources, this EUV lithography machine was developed by a team of former engineers from Dutch chip equipment giant $ASML(ASML.US), who reverse-engineered ASML's EUV machine. Currently, this Chinese EUV lithography machine is operational and successfully produces extreme ultraviolet light, but it has not yet produced usable chips.

It is reported that the Chinese government aims to achieve prototype chip production by 2028, while some experts estimate that mass production may not be achieved until 2030, still significantly ahead of the "at least 10 years" predicted by outsiders.

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