GUOFENG: The research and development of photosensitive polyimide photoresist is in the R&D stage

Zhitong
2025.06.20 08:24

GUOFENG stated on the interactive platform that the research and development of photosensitive polyimide photoresist is currently in the R&D stage. The product's development will be advanced for industrialization based on the R&D progress, market conditions, and other comprehensive considerations. The timeline remains uncertain, and investors are advised to pay attention to investment risks

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