AMEC's revenue in 2025 reached a record high of 12.3 billion yuan, with a net profit increase of 30.69%. Film equipment has become a new growth point | Financial Report Insights

AMEC has strengthened its competitive position in the domestic semiconductor equipment field with a revenue growth rate of over 30% and more than 5 billion yuan in R&D investment. On the 27th, AMEC released its performance report for the year 2025: Annual operating revenue is approximately 12.385 billion yuan, a year-on-year increase of about 36.62%; Net profit attributable to the parent company's owners is approximately 2.111 billion yuan, an increase of about 30.69% year-on-year. The company significantly increased its R&D investment during the same period, with total R&D expenditure of approximately 3.744 billion yuan, a year-on-year increase of about 52.65%, accounting for 30.23% of operating revenue. The growth in performance is driven by the scale expansion of core etching equipment and the rapid release of new product categories. Among them, the sales of LPCVD and ALD thin film equipment reached approximately 506 million yuan, a year-on-year increase of about 224.23%, significantly outpacing the main etching business. The company also disclosed that the processing accuracy and repeatability of ICP etching equipment have reached the single-atom level, marking a technological breakthrough entering a new stage. Etching Equipment Maintains Main Engine Position, Thin Film Equipment Rapidly Grows Etching equipment remains the core source of revenue for AMEC. In 2025, etching equipment sales are approximately 9.832 billion yuan, a year-on-year increase of about 35.12%, accounting for about 79% of total annual revenue. The company disclosed that stable and reliable mass production has been achieved for critical etching processes in advanced logic devices and ultra-high aspect ratio etching processes in advanced memory devices. By the end of 2025, the company has cumulatively installed over 7,800 reaction chambers in more than 170 customer chip and LED production lines both domestically and internationally, with cumulative global shipments of etching equipment reaction chambers exceeding 6,800 units. The rapid growth of thin film equipment is another highlight of this period's performance. Sales of LPCVD and ALD equipment increased by approximately 224.23% year-on-year, and the company's CDP product department has successfully launched more than ten types of conductor and dielectric thin film equipment for advanced memory and logic devices into the market, with cumulative shipments of LPCVD equipment exceeding 300 reaction chambers, and the equipment performance has reportedly reached an internationally leading level. High-Intensity Expansion of R&D Investment, Profit Growth Rate Pressured While experiencing high revenue growth, the company has actively chosen to sacrifice short-term profits for technological accumulation. In 2025, R&D expenses reached 2.475 billion yuan, a year-on-year increase of about 74.61%; total R&D investment was approximately 3.744 billion yuan, a year-on-year increase of about 52.65%, accounting for about 30.23% of revenue, which the company claims is far higher than the average of the Sci-Tech Innovation Board. The company listed the significant increase in R&D investment as one of the main reasons for the net profit growth rate being lower than the revenue growth rate in its announcement. Despite the revenue growth bringing a gross profit increase of approximately 1.128 billion yuan, R&D expenses increased by approximately 1.058 billion yuan during the same period, nearly offsetting the gross profit increase, thereby compressing the elasticity of operating profit. The new product lineup continues to expand, EPI and MOCVD enter the verification phase In addition to etching and thin film equipment, the company is actively laying out the epitaxy equipment and compound semiconductor fields. For EPI equipment, the low-pressure epitaxy equipment has been shipped to mature process and advanced process customers for mass production verification, and some advanced processes have entered the mass production verification stage; the atmospheric pressure epitaxy equipment has completed development and has entered the process verification stage. The next-generation high selectivity pre-cleaning chamber has also been verified for mass production at client sites. Regarding MOCVD equipment, the company claims to maintain its leading position in the international gallium nitride-based MOCVD equipment market, with new eight-inch silicon carbide epitaxy equipment and new red and yellow light LED application equipment shipped to leading domestic customers for verification. Multiple new MOCVD products dedicated to Micro-LED and display fields have also entered the client verification phase. The infrastructure construction supporting the above scale expansion is also in place. The company has put into use production and R&D bases of approximately 140,000 square meters in Nanchang and about 180,000 square meters in Shanghai Lingang. The company stated that it continues to develop key component suppliers to promote a stable and secure supply chain, maintaining a high level of equipment delivery rate. More news will be updated continuously……