Successful Development of New Photoresist Preparation Method: Overview of Photoresist-Related Companies

According to China Chemical News, an international cooperation team led by Associate Professor Zhuang Liwei from East China University of Science and Technology and Professor Michael Saphire from Johns Hopkins University has proposed a method for preparing amorphous zeolite imidazolate framework films through intermittent spin-coating chemical liquid phase deposition, achieving controllable film deposition rates and thicknesses, and has conducted verification through electron beam lithography and extreme ultraviolet lithography. The related research was recently published in Nature - Chemical Engineering. It is reported that in recent years, aZIF films have been used as advanced photoresists. Achieving large-area and high-precision controllable preparation of aZIF films is of great significance for advanced photolithography processes in related fields. Based on the previous strategy of preparing aZIF films using ultra-dilute precursor solution-enabled chemical liquid phase deposition, the research team proposed a new method for preparing aZIF films. According to the company's business operations and its disclosures on the investor relations interaction platform, there are 20 companies in the A-share market engaged in the semiconductor photoresist business, including Shanghai Sinyang, NATA OPTO-ELECT, and FPI. Among these companies, there are both upstream and downstream companies in the semiconductor industry chain, as well as subsidiaries or affiliated companies involved in the semiconductor photoresist business